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Date:September 17, 2012

Water slurry for Chemical Mechanical Polishing (CMP)

PML’s Particle On-Line Analyzer (POLA) has consistently detected, measured and sized slurry particles that are being used  by FAB   for CMP. POLA capabilities of performing particle size distribution (PSD) of the tail of particles  larger than 0.25m have  been demonstrated. POLA has yielded valuable information, including in the particle size range 200-560nm where the instrumentation currently used by FAB’s  is not sensitive, if in the “tail” distribution domain.